Job Description
Overview
Location: Fab10N Singapore
Department: Process Development – Singapore (Photolithography)
Project title: Edge Placement Error Modeling and Optimization
Project Description: Develop and optimize models for overlay and critical dimension uniformity improvement. Project scope: Introduction to photolithography for semiconductor patterning and control.
Deliverables- Develop and deploy edge placement error model for photolithography
- Mathematical modeling and numerical analysis with programming knowledge (preferred)
- Characterization techniques: SEM, optical imaging
- Semiconductor Manufacturing
- Nanomaterials
- Physics
- Mathematical modeling
- Programming
4-6 months (minimum 4 months)
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